The 45 nanometer line-width test patterns shown were produced with an advanced Immersion Lithography System installed at SEMATECH in Austin, Texas. Variation between the images is due to the effect of building floor vibration on the photolithography process. The images shown were obtained using a scanning electron microscope.

The Tool  was initially installed on a steel and concrete platform with a steel support structure which incorporated commercial elastomer vibration isolation pads. This pedestal did not achieve the tool's specified vibration criteria and pattern quality was poor. In an attempt to reduce vibration, the elastomer pads were effectively shorted out with metal shims leading to a more rigid, non-resonant structure, but this resulted in little improvement.